no2 standard cell family
2-I/P NOR gate
UP
PREV
NEXT
The no2_x1 is a single stage 2-NOR with P/N ratio of 2.1. The no2_x4 is a 3 stage 2-NOR with stage efforts of about 0.9 and 3.9.
nq:(i0+i1)'
cell width
power
Generic 0.13um typical timing (ps & ps/fF), pin
i1
.
leakage
dynamic
tR=PropR+RampR×Load(fF), tF=PropF+RampF×Load(fF)
sxlib013
gates
lambda
0.13um
nW
nW/MHz
PinCap
PropR
RampR
PropF
RampF
no2_x1
1.3
40
2.20
0.69
11.4
5.9f
48
2.90
48
2.29
no2_x4
2.3
70
3.85
2.43
61.4
6.2f
148
0.74
154
0.57
no2_x1
Effort
FO4
Log.
i0
/\
1.68
1.78
¯_
i1
/\
1.56
1.79
¯_
no2_x4
Effort
FO4
Log.
i0
/\
2.59
0.51
¯_
i1
/\
2.39
0.48
¯_
Web data book for the sxlib. V
dd
=1.2V, T=27°C, nominal process, generic 0.13um technology. Copyright © 2005-2007 Graham Petley. 08 JUL 2007